Prof. Dr.-Ing. Stefan Altmeyer

• Fourier-Algorithm basiertes Low-Cost-OCT zur Glaukom-Vorsorge; Altmeyer Stefan und Oberheide Uwe; Bundesministerium für Bildung und Forschung

• Polychromatic Virtual Retinal Imaging of Two Extended-Depth-of-Focus Intraocular Lenses
• Robust Real-Time Retinal Tracking for Ophthalmic Applications
• Functional Design Analysis of Two Current Extended-Depth-of-Focus Intraocular Lenses
• Characterization of Diffractive Bifocal Intraocular Lenses
• Purely Spectrometric Method to Measure the Bias Refractive Index Including its Dispersion and the Swelling or Shrinking of Holographic Materials
• Mechano-optical Modulator Based on a Rotating Optical Flat Applied to Simultaneous Holographic Multiplexing of Gratings
• Rotating Optical Flat for Simultaneous Holographic Multiplexing
• Fringe Visibility Degeneration Utilizing a Rotating Optical Flat for Holographic Multiplexing Purposes
• Multiplexing von Transmissionshologrammen in Fotopolymer
• Quantitative Determination of the Optical Properties of Phase Objects by Using a Real-time Phase Retrieval Technique
• Refractive Index Determination of Transparent Samples by Noniterative Phase Retrieval
• Non-Interferometric, non-Iterative Phase Retrieval by Green’s Functions
• Observation of Gelation Process and Particle Distribution During Sol-Gel Synthesis by Particle Image Velocimetry
• Polarization-Independent Isolation of High Power Laser Radiation
• Innovationen durch Femtosekunden-Laser
• Coulomb Blockade Effects in a Highly Doped Silicon Quantum Wire Fabricated on Novel Molecular Beam Epitaxy Grown Material
• A new Concept for the Design and Realization of Metal based Single Electron Devices
• Direct Patterning of Single Electron Tunneling Transistors by High Resolution Electron Beam Lithography on Highly Doped Molecular Beam Epitaxy Grown Silicon Films
• Fabrication of Silicon and Metal Nanowires and Dots Using Mechanical Atomic Force Lithography
• MOS-Compatible Fabrication and Characterization of Tunnel Junctions in BESOI-Material
• Novel approach to atomic force lithography
• On the Influence of Rare Earth Doping on Microstructure and Phase Composition of Sputtered, Epitaxial Bi₂Sr₂(Caₓ₋₁REₓ)Cu₂O ₈₊δ Films and Multilayers
• Potential and Challenges of Single Electron Devices
• 77 K Single Electron Transistors Fabricated with 0.1 μm Technology
• Metal-Oxide-Semiconductor-Compatible Silicon Based Single Electron Transistor Using Bonded and Etched Back Silicon on Insulator Material
• A possible Road to 77 K Single-Electron Devices
• Metal Based Single Electron Transistors Operating at Several Kelvin
• Step edge cut off - A new fabrication process for metal-based single electron devices

Publikationsliste
Publikationsliste (CSV)
Publikationsliste (PDF) im "American Psychological Association 6th edition (DOI)"-Zitierstil
Publikationsliste (PDF) im "Anglia Ruskin University - Harvard"-Zitierstil
Publikationsliste (PDF) im "Gesellschaft für Bildung und Forschung in Europa - Harvard"-Zitierstil

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